Development of high-performance semiconductor plasma equipment and process technology

Specially Appointed Professor

Tetsuya Goto


The research and development of plasma technology, which is indispensable for the manufacture of high-performance semiconductors, is the focus of our research and development activities. In addition to the creation of plasma sources that can utilize extremely active radicals with high efficiency and the development of deposition technology that can control the atomic layer level of complex shapes, we are working on the development of plasma systems and process technology for advanced fine semiconductor manufacturing through industry-academia collaboration by making full use of plasma measurement and evaluation technology.